Facial Recognition Based Attendance Management System Implementation: A Deep Learning Approach for the Auchi Polytechnic Institution, Edo State Facial Recognition Based Attendance Management System Implementation: A Deep Learning Approach for the Auchi Polytechnic Institution, Edo State – Direct Research Journal of Engineering and Information Technology
Original Research Article

Facial Recognition Based Attendance Management System Implementation: A Deep Learning Approach for the Auchi Polytechnic Institution, Edo State

Zibril Aliyu Oshozekhai

Obeten, Okoi Michael

Kanoba, Idris Isah

Article Number: DRJEIT26781599
DOI: https://doi.org/10.26765/DRJEIT26781599
ISSN: 2354-4155

Vol. 11 (3), Pp. 23-28, March 2023

Copyright © 2023

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This article is published under the terms of the

Creative Commons Attribution License 4.0.


Abstract

Taking attendance in a large class can be time-consuming and tiresome, wasting important instructional time. To address this issue, this research introduces the Auchi Poly-Convolutional Neural Network (AP-CNN), a deep learning-based automatic attendance system. The system is image recognition-based, with two key processes: face detection and face recognition. The system’s goal is to recognize students in the School of Information and Communication Technology (ICT), tag them with their names, and then match those names with faces in a database using real-time video feeds from a designated learning environment. According to the study’s findings, the small student dataset had a 96% accuracy rate. Using real-time attendance records of the students present, this technology can help instructors manage efficient classes.  It can also be useful for monitoring student participation, spotting absenteeism trends, and comprehending the class’s overall attendance. The information can also be utilized to identify any attendance-related problems and to modify the class schedule or teaching strategies as needed.

Keywords: Attendance management system, deep learning, face recognition, algorithm
 Received: February 6, 2023  Accepted: March 9, 2023  Published: March 21, 2023



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